Thin Film Analysis
XPS Analysis (10 nm depth, elemental and chemical bond analysis):
- Surface chemistry and film stoichiometry, especially subject to variation for sputtered or CVD films
- Elemental composition as a function of depth, useful to examine multilayer film structures such as anti-reflective coatings, metallization layers on ceramics for brazing, or coatings such as TiN on biomedical devices
- Interface contamination
- Surface hydration measurements
- Failure analysis of delamination problems
- Determine whether film layers have reacted or boundaries are sharp
- Diffusion as a function of temperature in vacuum
- Reaction of discrete film with other layers or with substrate as a function of temperature, such as due to brazing or soldering
- Reaction of film or multilayered film with heating in various gases
- Surface analysis of polymers, but cannot perform ion etching analysis of polymers